Prebaking and silicon epitaxial growth enhanced by UV radiation

A. Ishitani, Y. Ohshita, K. Tanigaki, K. Takada, S. Itoh

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

UV light irradiation effects on prebaking and silicon epitaxial growth is studied. An ArF excimer laser, a KrF excimer laser, and a Hg-Xe lamp are used as light sources. The epitaxial growth is carried out using a SiH 2Cl2/H2 system under reduced pressure. ArF radiation and Hg-Xe radiation are found to be effective for volatilizing native SiO2 on silicon-substrate surfaces even at low temperatures. When a substrate surface is irradiated with these UV radiations during prebaking and epitaxial growth, epilayer surface morphology and crystalline quality are much improved. Furthermore, the epitaxial growth rate seems to be enhanced photothermally by excimer laser radiations, and photochemically by Hg-Xe radiation.

Original languageEnglish
Pages (from-to)2224-2229
Number of pages6
JournalJournal of Applied Physics
Volume61
Issue number6
DOIs
Publication statusPublished - 1987 Dec 1
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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