Pre-existing and process induced defects in high-k gate dielectrics - Direct observation with EBIC and impact on 1/f noise

Motoyuki Sato, Jun Chen, Takashi Sekiguchi, Toyohiro Chikyow, Jiro Yugami, Kazuto Ikeda, Yuzuru Ohji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

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Engineering & Materials Science