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Pre-existing and process induced defects in high-k gate dielectrics - Direct observation with EBIC and impact on 1/f noise
Motoyuki Sato, Jun Chen, Takashi Sekiguchi, Toyohiro Chikyow, Jiro Yugami, Kazuto Ikeda, Yuzuru Ohji
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
1
Citation
(Scopus)