PRACTICAL PHOTOMASK PINHOLE DEFECT REPAIR USING MICROMETER SCALE PATTERN CD CVD WITH KHZ REPETITION UV LIGHT PULSES.

Y. Morishige; H. Yokoyama; S. Kishida; K. Washio; H. Kinoshita; S. Nakamura; R. Tatsumi

PRACTICAL PHOTOMASK PINHOLE DEFECT REPAIR USING MICROMETER SCALE PATTERN CD CVD WITH KHZ REPETITION UV LIGHT PULSES.

Y. Morishige, H. Yokoyama, S. Kishida, K. Washio, H. Kinoshita, S. Nakamura, R. Tatsumi

Research output: Contribution to conference › Paper › peer-review

Abstract

Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.

Original language	English
Pages	286-287
Number of pages	2
Publication status	Published - 1985 Dec 1
Externally published	Yes

ASJC Scopus subject areas

Engineering(all)

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title = "PRACTICAL PHOTOMASK PINHOLE DEFECT REPAIR USING MICROMETER SCALE PATTERN CD CVD WITH KHZ REPETITION UV LIGHT PULSES.",

abstract = "Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.",

author = "Y. Morishige and H. Yokoyama and S. Kishida and K. Washio and H. Kinoshita and S. Nakamura and R. Tatsumi",

year = "1985",

month = dec,

day = "1",

language = "English",

pages = "286--287",

}

TY - CONF

T1 - PRACTICAL PHOTOMASK PINHOLE DEFECT REPAIR USING MICROMETER SCALE PATTERN CD CVD WITH KHZ REPETITION UV LIGHT PULSES.

AU - Morishige, Y.

AU - Yokoyama, H.

AU - Kishida, S.

AU - Washio, K.

AU - Kinoshita, H.

AU - Nakamura, S.

AU - Tatsumi, R.

PY - 1985/12/1

Y1 - 1985/12/1

N2 - Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.

AB - Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.

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M3 - Paper

AN - SCOPUS:0022288879

SP - 286

EP - 287

ER -