Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.
|Number of pages||2|
|Publication status||Published - 1985 Dec 1|
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