Powder jet deposition of ceramic films

Nobuhito Yoshihara; Tsunemoto Kuriyagawa; Yuya Yasutomi; Kazuhiro Ogawa

Powder jet deposition of ceramic films

Nobuhito Yoshihara, Tsunemoto Kuriyagawa, Yuya Yasutomi, Kazuhiro Ogawa

Research output: Contribution to conference › Paper › peer-review

Abstract

Ceramic films are needed in micro-electro-mechanical systems as insulating, piezoelectric and ferroelectric materials. The required film thickness is 1-10 μm. This is too thin to machine by polishing or grinding, and too thick to grow by chemical or physical vapor deposition. The present study proposes a new method called powder jet deposition (PJD) for fabricating ceramic films 1-10 μm in thickness. Indentation and scratching tests are performed on ceramic films deposited by the PJD method. It is found that the hardness of the films depends on PJD conditions.

Original language	English
Pages	833-838
Number of pages	6
Publication status	Published - 2005 Dec 1
Event	3rd International Conference on Leading Edge Manufacturing in 21st Century, LEM 2005 - Nagoya, Japan Duration: 2005 Oct 19 → 2005 Oct 22

Other

Other	3rd International Conference on Leading Edge Manufacturing in 21st Century, LEM 2005
Country	Japan
City	Nagoya
Period	05/10/19 → 05/10/22

Keywords

Ceramic film
Hardness
Powder jet deposition

ASJC Scopus subject areas

Industrial and Manufacturing Engineering

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abstract = "Ceramic films are needed in micro-electro-mechanical systems as insulating, piezoelectric and ferroelectric materials. The required film thickness is 1-10 μm. This is too thin to machine by polishing or grinding, and too thick to grow by chemical or physical vapor deposition. The present study proposes a new method called powder jet deposition (PJD) for fabricating ceramic films 1-10 μm in thickness. Indentation and scratching tests are performed on ceramic films deposited by the PJD method. It is found that the hardness of the films depends on PJD conditions.",

keywords = "Ceramic film, Hardness, Powder jet deposition",

author = "Nobuhito Yoshihara and Tsunemoto Kuriyagawa and Yuya Yasutomi and Kazuhiro Ogawa",

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T1 - Powder jet deposition of ceramic films

AU - Yoshihara, Nobuhito

AU - Kuriyagawa, Tsunemoto

AU - Yasutomi, Yuya

AU - Ogawa, Kazuhiro

PY - 2005/12/1

Y1 - 2005/12/1

N2 - Ceramic films are needed in micro-electro-mechanical systems as insulating, piezoelectric and ferroelectric materials. The required film thickness is 1-10 μm. This is too thin to machine by polishing or grinding, and too thick to grow by chemical or physical vapor deposition. The present study proposes a new method called powder jet deposition (PJD) for fabricating ceramic films 1-10 μm in thickness. Indentation and scratching tests are performed on ceramic films deposited by the PJD method. It is found that the hardness of the films depends on PJD conditions.

AB - Ceramic films are needed in micro-electro-mechanical systems as insulating, piezoelectric and ferroelectric materials. The required film thickness is 1-10 μm. This is too thin to machine by polishing or grinding, and too thick to grow by chemical or physical vapor deposition. The present study proposes a new method called powder jet deposition (PJD) for fabricating ceramic films 1-10 μm in thickness. Indentation and scratching tests are performed on ceramic films deposited by the PJD method. It is found that the hardness of the films depends on PJD conditions.

KW - Ceramic film

KW - Hardness

KW - Powder jet deposition

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T2 - 3rd International Conference on Leading Edge Manufacturing in 21st Century, LEM 2005

Y2 - 19 October 2005 through 22 October 2005

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