Powder jet deposition of ceramic films

Nobuhito Yoshihara, Tsunemoto Kuriyagawa, Yuya Yasutomi, Kazuhiro Ogawa

Research output: Contribution to conferencePaperpeer-review

13 Citations (Scopus)

Abstract

Ceramic films are needed in micro-electro-mechanical systems as insulating, piezoelectric and ferroelectric materials. The required film thickness is 1-10 μm. This is too thin to machine by polishing or grinding, and too thick to grow by chemical or physical vapor deposition. The present study proposes a new method called powder jet deposition (PJD) for fabricating ceramic films 1-10 μm in thickness. Indentation and scratching tests are performed on ceramic films deposited by the PJD method. It is found that the hardness of the films depends on PJD conditions.

Original languageEnglish
Pages833-838
Number of pages6
Publication statusPublished - 2005 Dec 1
Event3rd International Conference on Leading Edge Manufacturing in 21st Century, LEM 2005 - Nagoya, Japan
Duration: 2005 Oct 192005 Oct 22

Other

Other3rd International Conference on Leading Edge Manufacturing in 21st Century, LEM 2005
Country/TerritoryJapan
CityNagoya
Period05/10/1905/10/22

Keywords

  • Ceramic film
  • Hardness
  • Powder jet deposition

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering

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