Abstract
Ceramic films are needed in micro-electro-mechanical systems as insulating, piezoelectric and ferroelectric materials. The required film thickness is 1-10 μm. This is too thin to machine by polishing or grinding, and too thick to grow by chemical or physical vapor deposition. The present study proposes a new method called powder jet deposition (PJD) for fabricating ceramic films 1-10 μm in thickness. Indentation and scratching tests are performed on ceramic films deposited by the PJD method. It is found that the hardness of the films depends on PJD conditions.
Original language | English |
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Pages | 833-838 |
Number of pages | 6 |
Publication status | Published - 2005 Dec 1 |
Event | 3rd International Conference on Leading Edge Manufacturing in 21st Century, LEM 2005 - Nagoya, Japan Duration: 2005 Oct 19 → 2005 Oct 22 |
Other
Other | 3rd International Conference on Leading Edge Manufacturing in 21st Century, LEM 2005 |
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Country | Japan |
City | Nagoya |
Period | 05/10/19 → 05/10/22 |
Keywords
- Ceramic film
- Hardness
- Powder jet deposition
ASJC Scopus subject areas
- Industrial and Manufacturing Engineering