TY - JOUR
T1 - Potential profile around step edges of Si surface measured by nc-AFM
AU - Hasegawa, Y.
AU - Eguchi, T.
N1 - Funding Information:
The author acknowledges C. Wülker, P. Baumann, and J. Schuler, Omicron, for technical assistance. This work is partly supported by Grant-in-Aid for Scientific Research (No. 12875059), Ministry of Education, Science, Sports and Culture, Japan.
PY - 2002/3/28
Y1 - 2002/3/28
N2 - Using a surface potential measurement method attached to non-contact atomic force microscope (nc-AFM), electrostatic potential at the step edges of the Si(1 1 1)7 × 7 surface is measured and found to be higher than that of terrace. The obtained result is opposite to the cases of Au and Cu(1 1 1) surfaces, where work function measurement with scanning tunneling microscopy (STM) revealed reduced work function at the step edges. Atomically resolved images taken in various modes with nc-AFM are also presented.
AB - Using a surface potential measurement method attached to non-contact atomic force microscope (nc-AFM), electrostatic potential at the step edges of the Si(1 1 1)7 × 7 surface is measured and found to be higher than that of terrace. The obtained result is opposite to the cases of Au and Cu(1 1 1) surfaces, where work function measurement with scanning tunneling microscopy (STM) revealed reduced work function at the step edges. Atomically resolved images taken in various modes with nc-AFM are also presented.
KW - Non-contact atomic force microscope
KW - Scanning tunneling microscopy
KW - Surface potential
KW - Work function
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U2 - 10.1016/S0169-4332(01)00955-2
DO - 10.1016/S0169-4332(01)00955-2
M3 - Article
AN - SCOPUS:0037187249
VL - 188
SP - 386
EP - 390
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
IS - 3-4
ER -