Potential profile around step edges of Si surface measured by nc-AFM

Y. Hasegawa, T. Eguchi

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


Using a surface potential measurement method attached to non-contact atomic force microscope (nc-AFM), electrostatic potential at the step edges of the Si(1 1 1)7 × 7 surface is measured and found to be higher than that of terrace. The obtained result is opposite to the cases of Au and Cu(1 1 1) surfaces, where work function measurement with scanning tunneling microscopy (STM) revealed reduced work function at the step edges. Atomically resolved images taken in various modes with nc-AFM are also presented.

Original languageEnglish
Pages (from-to)386-390
Number of pages5
JournalApplied Surface Science
Issue number3-4
Publication statusPublished - 2002 Mar 28


  • Non-contact atomic force microscope
  • Scanning tunneling microscopy
  • Surface potential
  • Work function

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


Dive into the research topics of 'Potential profile around step edges of Si surface measured by nc-AFM'. Together they form a unique fingerprint.

Cite this