Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

Taro Itatani, Sucheta Gorwadkar, Takafumi Fukushima, Masanori Komuro, Hiroshi Itatani, Masao Tomoi, Tsuenenori Sakamoto, Syunichi Matsumoto

Research output: Contribution to journalConference articlepeer-review

16 Citations (Scopus)

Abstract

We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm2, and line and space patterns of 0.25 μm at a dose of 190 mJ/cm2.

Original languageEnglish
Pages (from-to)552-558
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3999 (I)
DOIs
Publication statusPublished - 2000 Jan 1
Externally publishedYes
EventAdvances in Resist Technology and Processing XVII - Santa Clara, CA, USA
Duration: 2000 Feb 282000 Mar 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography'. Together they form a unique fingerprint.

Cite this