Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

Taro Itatani; Sucheta Gorwadkar; Takafumi Fukushima; Masanori Komuro; Hiroshi Itatani; Masao Tomoi; Tsuenenori Sakamoto; Syunichi Matsumoto

doi:10.1117/12.388339

Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

Taro Itatani, Sucheta Gorwadkar, Takafumi Fukushima, Masanori Komuro, Hiroshi Itatani, Masao Tomoi, Tsuenenori Sakamoto, Syunichi Matsumoto

Research output: Contribution to journal › Conference article › peer-review

17 Citations (Scopus)

Abstract

We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm², and line and space patterns of 0.25 μm at a dose of 190 mJ/cm².

Original language	English
Pages (from-to)	552-558
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3999 (I)
DOIs	https://doi.org/10.1117/12.388339
Publication status	Published - 2000
Externally published	Yes
Event	Advances in Resist Technology and Processing XVII - Santa Clara, CA, USA Duration: 2000 Feb 28 → 2000 Mar 1

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.388339

Cite this

@article{60c4f33d65994ab4b989778ce928475c,

title = "Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography",

abstract = "We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm2, and line and space patterns of 0.25 μm at a dose of 190 mJ/cm2.",

author = "Taro Itatani and Sucheta Gorwadkar and Takafumi Fukushima and Masanori Komuro and Hiroshi Itatani and Masao Tomoi and Tsuenenori Sakamoto and Syunichi Matsumoto",

year = "2000",

doi = "10.1117/12.388339",

language = "English",

volume = "3999 (I)",

pages = "552--558",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Advances in Resist Technology and Processing XVII ; Conference date: 28-02-2000 Through 01-03-2000",

}

TY - JOUR

T1 - Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

AU - Itatani, Taro

AU - Gorwadkar, Sucheta

AU - Fukushima, Takafumi

AU - Komuro, Masanori

AU - Itatani, Hiroshi

AU - Tomoi, Masao

AU - Sakamoto, Tsuenenori

AU - Matsumoto, Syunichi

PY - 2000

Y1 - 2000

N2 - We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm2, and line and space patterns of 0.25 μm at a dose of 190 mJ/cm2.

AB - We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm2, and line and space patterns of 0.25 μm at a dose of 190 mJ/cm2.

UR - http://www.scopus.com/inward/record.url?scp=0033692327&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033692327&partnerID=8YFLogxK

U2 - 10.1117/12.388339

DO - 10.1117/12.388339

M3 - Conference article

AN - SCOPUS:0033692327

VL - 3999 (I)

SP - 552

EP - 558

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

T2 - Advances in Resist Technology and Processing XVII

Y2 - 28 February 2000 through 1 March 2000

ER -

Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this