Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

Taro Itatani; Sucheta Gorwadkar; Takafumi Fukushima; Masanori Komuro; Hiroshi Itatani; Masao Tomoi; Tsuenenori Sakamoto; Syunichi Matsumoto

doi:10.1117/12.388339

Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

Taro Itatani, Sucheta Gorwadkar, Takafumi Fukushima, Masanori Komuro, Hiroshi Itatani, Masao Tomoi, Tsuenenori Sakamoto, Syunichi Matsumoto

Research output: Contribution to journal › Conference article › peer-review

16 Citations (Scopus)

Abstract

We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm², and line and space patterns of 0.25 μm at a dose of 190 mJ/cm².

Original language	English
Pages (from-to)	552-558
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3999 (I)
DOIs	https://doi.org/10.1117/12.388339
Publication status	Published - 2000 Jan 1
Externally published	Yes
Event	Advances in Resist Technology and Processing XVII - Santa Clara, CA, USA Duration: 2000 Feb 28 → 2000 Mar 1

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography. / Itatani, Taro; Gorwadkar, Sucheta; Fukushima, Takafumi; Komuro, Masanori; Itatani, Hiroshi; Tomoi, Masao; Sakamoto, Tsuenenori; Matsumoto, Syunichi.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 3999 (I), 01.01.2000, p. 552-558.

Research output: Contribution to journal › Conference article › peer-review

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abstract = "We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm2, and line and space patterns of 0.25 μm at a dose of 190 mJ/cm2.",

author = "Taro Itatani and Sucheta Gorwadkar and Takafumi Fukushima and Masanori Komuro and Hiroshi Itatani and Masao Tomoi and Tsuenenori Sakamoto and Syunichi Matsumoto",

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AU - Itatani, Taro

AU - Gorwadkar, Sucheta

AU - Fukushima, Takafumi

AU - Komuro, Masanori

AU - Itatani, Hiroshi

AU - Tomoi, Masao

AU - Sakamoto, Tsuenenori

AU - Matsumoto, Syunichi

PY - 2000/1/1

Y1 - 2000/1/1

N2 - We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm2, and line and space patterns of 0.25 μm at a dose of 190 mJ/cm2.

AB - We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 μm at a dose of 170 mJ/cm2, and line and space patterns of 0.25 μm at a dose of 190 mJ/cm2.

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

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T2 - Advances in Resist Technology and Processing XVII

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