Abstract
Nanoporous polysiloxane films were fabricated by plasma polymerization. The pores were generated through the elimination of carbonaceous aggregates (porogen) by thermal treatment. The generated pore sizes deduced from positron annihilation lifetime spectroscopy were in a range between 0.6 nm to 1.0 nm in radius and correlated with the amount of the porogen decomposed by annealing.
| Original language | English |
|---|---|
| Number of pages | 1 |
| Publication status | Published - 2006 Dec 1 |
| Externally published | Yes |
| Event | 55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, Japan Duration: 2006 Sep 20 → 2006 Sep 22 |
Other
| Other | 55th Society of Polymer Science Japan Symposium on Macromolecules |
|---|---|
| Country | Japan |
| City | Toyama |
| Period | 06/9/20 → 06/9/22 |
Keywords
- Nanopore
- Plasma-polymerized polysiloxane film
- Positron annihilation lifetime spectroscopy
ASJC Scopus subject areas
- Engineering(all)
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Cite this
Oka, T., Ito, K., He, C., Ohdaira, T., Suzuki, R., & Kobayashi, Y. (2006). Porogen approach for the fabrication of plasma-polymerized porous polysiloxane films. Paper presented at 55th Society of Polymer Science Japan Symposium on Macromolecules, Toyama, Japan.