Porogen approach for the fabrication of plasma-polymerized porous polysiloxane films

Toshitaka Oka; Kenji Ito; Chunqing He; Toshiyuki Ohdaira; Ryoichi Suzuki; Yoshinori Kobayashi

Porogen approach for the fabrication of plasma-polymerized porous polysiloxane films

Toshitaka Oka, Kenji Ito, Chunqing He, Toshiyuki Ohdaira, Ryoichi Suzuki, Yoshinori Kobayashi

Research output: Contribution to conference › Paper › peer-review

Abstract

Nanoporous polysiloxane films were fabricated by plasma polymerization. The pores were generated through the elimination of carbonaceous aggregates (porogen) by thermal treatment. The generated pore sizes deduced from positron annihilation lifetime spectroscopy were in a range between 0.6 nm to 1.0 nm in radius and correlated with the amount of the porogen decomposed by annealing.

Original language	English
Number of pages	1
Publication status	Published - 2006 Dec 1
Externally published	Yes
Event	55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, Japan Duration: 2006 Sep 20 → 2006 Sep 22

Other

Other	55th Society of Polymer Science Japan Symposium on Macromolecules
Country/Territory	Japan
City	Toyama
Period	06/9/20 → 06/9/22

Keywords

Nanopore
Plasma-polymerized polysiloxane film
Positron annihilation lifetime spectroscopy

ASJC Scopus subject areas

Engineering(all)

Cite this

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title = "Porogen approach for the fabrication of plasma-polymerized porous polysiloxane films",

abstract = "Nanoporous polysiloxane films were fabricated by plasma polymerization. The pores were generated through the elimination of carbonaceous aggregates (porogen) by thermal treatment. The generated pore sizes deduced from positron annihilation lifetime spectroscopy were in a range between 0.6 nm to 1.0 nm in radius and correlated with the amount of the porogen decomposed by annealing.",

keywords = "Nanopore, Plasma-polymerized polysiloxane film, Positron annihilation lifetime spectroscopy",

author = "Toshitaka Oka and Kenji Ito and Chunqing He and Toshiyuki Ohdaira and Ryoichi Suzuki and Yoshinori Kobayashi",

year = "2006",

month = dec,

day = "1",

language = "English",

note = "55th Society of Polymer Science Japan Symposium on Macromolecules ; Conference date: 20-09-2006 Through 22-09-2006",

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TY - CONF

T1 - Porogen approach for the fabrication of plasma-polymerized porous polysiloxane films

AU - Oka, Toshitaka

AU - Ito, Kenji

AU - He, Chunqing

AU - Ohdaira, Toshiyuki

AU - Suzuki, Ryoichi

AU - Kobayashi, Yoshinori

PY - 2006/12/1

Y1 - 2006/12/1

N2 - Nanoporous polysiloxane films were fabricated by plasma polymerization. The pores were generated through the elimination of carbonaceous aggregates (porogen) by thermal treatment. The generated pore sizes deduced from positron annihilation lifetime spectroscopy were in a range between 0.6 nm to 1.0 nm in radius and correlated with the amount of the porogen decomposed by annealing.

AB - Nanoporous polysiloxane films were fabricated by plasma polymerization. The pores were generated through the elimination of carbonaceous aggregates (porogen) by thermal treatment. The generated pore sizes deduced from positron annihilation lifetime spectroscopy were in a range between 0.6 nm to 1.0 nm in radius and correlated with the amount of the porogen decomposed by annealing.

KW - Nanopore

KW - Plasma-polymerized polysiloxane film

KW - Positron annihilation lifetime spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=33846121261&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33846121261&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:33846121261

T2 - 55th Society of Polymer Science Japan Symposium on Macromolecules

Y2 - 20 September 2006 through 22 September 2006

ER -

Porogen approach for the fabrication of plasma-polymerized porous polysiloxane films

Abstract

Other

Keywords

ASJC Scopus subject areas

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