Porogen approach for the fabrication of plasma-polymerized porous polysiloxane films

Toshitaka Oka, Kenji Ito, Chunqing He, Toshiyuki Ohdaira, Ryoichi Suzuki, Yoshinori Kobayashi

Research output: Contribution to conferencePaper

Abstract

Nanoporous polysiloxane films were fabricated by plasma polymerization. The pores were generated through the elimination of carbonaceous aggregates (porogen) by thermal treatment. The generated pore sizes deduced from positron annihilation lifetime spectroscopy were in a range between 0.6 nm to 1.0 nm in radius and correlated with the amount of the porogen decomposed by annealing.

Original languageEnglish
Number of pages1
Publication statusPublished - 2006 Dec 1
Externally publishedYes
Event55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, Japan
Duration: 2006 Sep 202006 Sep 22

Other

Other55th Society of Polymer Science Japan Symposium on Macromolecules
CountryJapan
CityToyama
Period06/9/2006/9/22

Keywords

  • Nanopore
  • Plasma-polymerized polysiloxane film
  • Positron annihilation lifetime spectroscopy

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Oka, T., Ito, K., He, C., Ohdaira, T., Suzuki, R., & Kobayashi, Y. (2006). Porogen approach for the fabrication of plasma-polymerized porous polysiloxane films. Paper presented at 55th Society of Polymer Science Japan Symposium on Macromolecules, Toyama, Japan.