Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films

Toshitaka Oka, Kenji Ito, Makoto Muramatsu, Toshiyuki Ohdaira, Ryoichl Suzuki, Yoshinori Kobayashi

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

Nanoporous polysiloxane films were fabricated by plasma polymerization of hexamethyldisiloxane mixed with cyclohexane under different conditions. The pores were generated through the elimination of carbonaceous aggregates (porogen) by annealing at 600 °C. Results of spectroscopic ellipsometry, Fourier transform infrared spectroscopy, and positron annihilation lifetime spectroscopy suggest that not only film porosity but also average pore size depends on the amount of the decomposable porogen. The pore size was controllable in a range between 0.6 and 1.0 nm in radius by proper selection of the .substrate temperature and precursor composition.

Original languageEnglish
Pages (from-to)20172-20176
Number of pages5
JournalJournal of Physical Chemistry B
Volume110
Issue number41
DOIs
Publication statusPublished - 2006 Oct 19
Externally publishedYes

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

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    Oka, T., Ito, K., Muramatsu, M., Ohdaira, T., Suzuki, R., & Kobayashi, Y. (2006). Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films. Journal of Physical Chemistry B, 110(41), 20172-20176. https://doi.org/10.1021/jp063013t