Abstract
Nanoporous polysiloxane films were fabricated by plasma polymerization of hexamethyldisiloxane mixed with cyclohexane under different conditions. The pores were generated through the elimination of carbonaceous aggregates (porogen) by annealing at 600 °C. Results of spectroscopic ellipsometry, Fourier transform infrared spectroscopy, and positron annihilation lifetime spectroscopy suggest that not only film porosity but also average pore size depends on the amount of the decomposable porogen. The pore size was controllable in a range between 0.6 and 1.0 nm in radius by proper selection of the .substrate temperature and precursor composition.
| Original language | English |
|---|---|
| Pages (from-to) | 20172-20176 |
| Number of pages | 5 |
| Journal | Journal of Physical Chemistry B |
| Volume | 110 |
| Issue number | 41 |
| DOIs | |
| Publication status | Published - 2006 Oct 19 |
| Externally published | Yes |
ASJC Scopus subject areas
- Physical and Theoretical Chemistry
- Surfaces, Coatings and Films
- Materials Chemistry
Fingerprint Dive into the research topics of 'Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films'. Together they form a unique fingerprint.
Cite this
Oka, T., Ito, K., Muramatsu, M., Ohdaira, T., Suzuki, R., & Kobayashi, Y. (2006). Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films. Journal of Physical Chemistry B, 110(41), 20172-20176. https://doi.org/10.1021/jp063013t