Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films

Toshitaka Oka; Kenji Ito; Makoto Muramatsu; Toshiyuki Ohdaira; Ryoichl Suzuki; Yoshinori Kobayashi

doi:10.1021/jp063013t

Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films

Toshitaka Oka, Kenji Ito, Makoto Muramatsu, Toshiyuki Ohdaira, Ryoichl Suzuki, Yoshinori Kobayashi

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Abstract

Nanoporous polysiloxane films were fabricated by plasma polymerization of hexamethyldisiloxane mixed with cyclohexane under different conditions. The pores were generated through the elimination of carbonaceous aggregates (porogen) by annealing at 600 °C. Results of spectroscopic ellipsometry, Fourier transform infrared spectroscopy, and positron annihilation lifetime spectroscopy suggest that not only film porosity but also average pore size depends on the amount of the decomposable porogen. The pore size was controllable in a range between 0.6 and 1.0 nm in radius by proper selection of the .substrate temperature and precursor composition.

Original language	English
Pages (from-to)	20172-20176
Number of pages	5
Journal	Journal of Physical Chemistry B
Volume	110
Issue number	41
DOIs	https://doi.org/10.1021/jp063013t
Publication status	Published - 2006 Oct 19
Externally published	Yes

ASJC Scopus subject areas

Physical and Theoretical Chemistry
Surfaces, Coatings and Films
Materials Chemistry

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10.1021/jp063013t

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abstract = "Nanoporous polysiloxane films were fabricated by plasma polymerization of hexamethyldisiloxane mixed with cyclohexane under different conditions. The pores were generated through the elimination of carbonaceous aggregates (porogen) by annealing at 600 °C. Results of spectroscopic ellipsometry, Fourier transform infrared spectroscopy, and positron annihilation lifetime spectroscopy suggest that not only film porosity but also average pore size depends on the amount of the decomposable porogen. The pore size was controllable in a range between 0.6 and 1.0 nm in radius by proper selection of the .substrate temperature and precursor composition.",

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AU - Oka, Toshitaka

AU - Ito, Kenji

AU - Muramatsu, Makoto

AU - Ohdaira, Toshiyuki

AU - Suzuki, Ryoichl

AU - Kobayashi, Yoshinori

PY - 2006/10/19

Y1 - 2006/10/19

N2 - Nanoporous polysiloxane films were fabricated by plasma polymerization of hexamethyldisiloxane mixed with cyclohexane under different conditions. The pores were generated through the elimination of carbonaceous aggregates (porogen) by annealing at 600 °C. Results of spectroscopic ellipsometry, Fourier transform infrared spectroscopy, and positron annihilation lifetime spectroscopy suggest that not only film porosity but also average pore size depends on the amount of the decomposable porogen. The pore size was controllable in a range between 0.6 and 1.0 nm in radius by proper selection of the .substrate temperature and precursor composition.

AB - Nanoporous polysiloxane films were fabricated by plasma polymerization of hexamethyldisiloxane mixed with cyclohexane under different conditions. The pores were generated through the elimination of carbonaceous aggregates (porogen) by annealing at 600 °C. Results of spectroscopic ellipsometry, Fourier transform infrared spectroscopy, and positron annihilation lifetime spectroscopy suggest that not only film porosity but also average pore size depends on the amount of the decomposable porogen. The pore size was controllable in a range between 0.6 and 1.0 nm in radius by proper selection of the .substrate temperature and precursor composition.

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Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films

Abstract

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