Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

Yoshiaki Kanamori; Junya Sato; Takeshi Shimano; Shigeo Nakamura; Kazuhiro Hane

doi:10.1007/s00542-007-0380-7

Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

Yoshiaki Kanamori, Junya Sato, Takeshi Shimano, Shigeo Nakamura, Kazuhiro Hane

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed technique has been demonstrated by the fabrication of lens-like structures.

Original language	English
Pages (from-to)	1411-1416
Number of pages	6
Journal	Microsystem Technologies
Volume	13
Issue number	8-10
DOIs	https://doi.org/10.1007/s00542-007-0380-7
Publication status	Published - 2007 May 1

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Hardware and Architecture
Electrical and Electronic Engineering

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10.1007/s00542-007-0380-7

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abstract = "Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed technique has been demonstrated by the fabrication of lens-like structures.",

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T1 - Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

AU - Kanamori, Yoshiaki

AU - Sato, Junya

AU - Shimano, Takeshi

AU - Nakamura, Shigeo

AU - Hane, Kazuhiro

PY - 2007/5/1

Y1 - 2007/5/1

N2 - Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed technique has been demonstrated by the fabrication of lens-like structures.

AB - Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed technique has been demonstrated by the fabrication of lens-like structures.

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Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

Abstract

ASJC Scopus subject areas

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