Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

Yoshiaki Kanamori, Junya Sato, Takeshi Shimano, Shigeo Nakamura, Kazuhiro Hane

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed technique has been demonstrated by the fabrication of lens-like structures.

Original languageEnglish
Pages (from-to)1411-1416
Number of pages6
JournalMicrosystem Technologies
Volume13
Issue number8-10
DOIs
Publication statusPublished - 2007 May 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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