Polarization ray-tracing model for orthogonal two-axis Lloyd's mirror interference lithography

Xiuguo Chen, Zongwei Ren, Yuanliu Chen, Yuki Shimizu, Wei Gao

Research output: Contribution to conferencePaper

Abstract

In this work, we establish a three-dimensional (3D) polarization ray-tracing model to trace the evolution of polarization states of incident beams through the corner-cube-like interferometer unit of an orthogonal two-axis Lloyd's mirror interferometer. Compared with the conventional two-dimensional Jones matrix formalism, the 3D polarization ray-tracing model that represents polarization as a three-element electric field vector in the global coordinate system provides an easier approach to trace the polarization evolution. The comparison between the simulated and experimental interference fringes obtained under different combinations of initial polarization states of incident beams verify the feasibility of the established model.

Original languageEnglish
DOIs
Publication statusPublished - 2017 Nov 13
Event9th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2017 - Hiroshima City, Japan
Duration: 2017 Nov 132017 Nov 17

Other

Other9th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2017
CountryJapan
CityHiroshima City
Period17/11/1317/11/17

Keywords

  • Interference lithography
  • Multi-beam interference
  • Optical encoder
  • Polarization evolution
  • Polarization ray-tracing
  • Scale grating

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering

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    Chen, X., Ren, Z., Chen, Y., Shimizu, Y., & Gao, W. (2017). Polarization ray-tracing model for orthogonal two-axis Lloyd's mirror interference lithography. Paper presented at 9th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2017, Hiroshima City, Japan. https://doi.org/10.1299/jsmelem.2017.9.113