Polarity inversion and growth mechanism of AlN layer grown on nitrided sapphire substrate using Ga-Al liquid-phase epitaxy

Masayoshi Adachi, Mari Takasugi, Masashi Sugiyama, Junji Iida, Akikazu Tanaka, Hiroyuki Fukuyama

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Previously, we developed Ga-Al liquid-phase epitaxy (LPE) to grow AlN layers on a surface nitrided sapphire substrate using Ga-Al solutions. We found that polarity inversion occurs at the interface between the nitrided sapphire layer and the LPE layer. As the partial pressure of oxygen influences LPE growth, our current study investigated this growth by controlling oxygen in supplying nitrogen gas. Combined with the previous study, we discuss these results in light of the polarity inversion model and growth mechanism for the Ga-Al LPE technique. Oxygen atoms are believed to dissolve in the solution and get trapped on the surface of nitrided sapphire. The trapped oxygen atoms form a symmetrical octahedral structure, which resets the polarity of the nitrided sapphire. Consequently, chemically stable aluminum-polar AlN can be grown in the solution.

Original languageEnglish
Pages (from-to)743-747
Number of pages5
JournalPhysica Status Solidi (B) Basic Research
Volume252
Issue number4
DOIs
Publication statusPublished - 2015 Apr 1

Keywords

  • AlN
  • Ga-Al solutions
  • Liquid-phase epitaxy
  • Nitrided sapphire
  • Oxygen partial pressure
  • Polarity

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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