Plasma sputtering and optical properties of Au/SiO2 nano-composite films

Bo Ping Zhang, Li Shi Jiao, Hiroshi Masumoto, Takashi Goto

Research output: Contribution to journalConference article

Abstract

Au/SiO2 nano-composite thin films with 3 to 65 vol% Au content were prepared by induction-coil-coupled plasma sputtering. Au particles dispersed in the SiO2 matrix can be prepared by controlling the deposition time of one Au layer and the thickness of the one SiO2 layer. The Au nano-particle dispersed Au/SiO2 multilayer with an uniform nano-layered microstructure showed the absorption peak at the wavelength of 560 nm. The heat-treated Au/SiO2 films containing 3 to 65 vol% Au showed absorption peaks at the wavelength of 540 to 560 nm, while no absorption peak was observed in the as-deposited multilayers containing more than 12 vol% Au.

Original languageEnglish
Pages (from-to)1571-1574
Number of pages4
JournalMaterials Science Forum
Volume475-479
Issue numberII
DOIs
Publication statusPublished - 2005 Jan 1
EventPRICM 5: The Fifth Pacific Rim International Conference on Advanced Materials and Processing - Beijing, China
Duration: 2004 Nov 22004 Nov 5

Keywords

  • Au/Sio
  • Nano-composite film
  • Optical absorption spectra
  • Plasma sputtering

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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