Plasma research activities in the association of super-advanced electronics technologies

Masami Inoue, Akihiko Ishitani, Seiji Samukawa, Makoto Sekine

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Association of super-advanced electronics technologies (ASET) is a Japanese electronics research and development consortium that was founded on 29 February 1996. The target of the plasma research group in ASET is to make breakthroughs for future dry etching technology by investigating the mechanisms of dry etching scientifically. The plasma research group is investigating plasma diagnostics, plasma generation and its transportation, plasma surface reaction and vapor phase reaction, plasma modeling/simulation directed toward plasma control, and the mechanism of silicon oxide etching in high aspect ratio, narrow contact holes, and will develop a new chemistry, a new plasma source, and a new monitoring method.

Original languageEnglish
Pages (from-to)341-344
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume16
Issue number1
DOIs
Publication statusPublished - 1998 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint

Dive into the research topics of 'Plasma research activities in the association of super-advanced electronics technologies'. Together they form a unique fingerprint.

Cite this