Plasma confining potential self-consistently formed by local electron cyclotron resonance in a well-shaped magnetic field

T. Kaneko; R. Hatakeyama; N. Sato; S. Ishiguro

doi:10.1063/1.1456532

Plasma confining potential self-consistently formed by local electron cyclotron resonance in a well-shaped magnetic field

T. Kaneko, R. Hatakeyama, N. Sato, S. Ishiguro

ENG - Electronic Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Original language	English
Pages (from-to)	1271
Number of pages	1
Journal	Physics of Plasmas
Volume	9
Issue number	4
DOIs	https://doi.org/10.1063/1.1456532
Publication status	Published - 2002 Apr

ASJC Scopus subject areas

Condensed Matter Physics

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10.1063/1.1456532

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@article{0d914f1833cb4bce90f273d6fb2dddb0,

title = "Plasma confining potential self-consistently formed by local electron cyclotron resonance in a well-shaped magnetic field",

author = "T. Kaneko and R. Hatakeyama and N. Sato and S. Ishiguro",

year = "2002",

month = apr,

doi = "10.1063/1.1456532",

language = "English",

volume = "9",

pages = "1271",

journal = "Physics of Plasmas",

issn = "1070-664X",

publisher = "American Institute of Physics Publising LLC",

number = "4",

}

TY - JOUR

T1 - Plasma confining potential self-consistently formed by local electron cyclotron resonance in a well-shaped magnetic field

AU - Kaneko, T.

AU - Hatakeyama, R.

AU - Sato, N.

AU - Ishiguro, S.

PY - 2002/4

Y1 - 2002/4

UR - http://www.scopus.com/inward/record.url?scp=0036537210&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036537210&partnerID=8YFLogxK

U2 - 10.1063/1.1456532

DO - 10.1063/1.1456532

M3 - Article

AN - SCOPUS:0036537210

SN - 1070-664X

VL - 9

SP - 1271

JO - Physics of Plasmas

JF - Physics of Plasmas

IS - 4

ER -

Plasma confining potential self-consistently formed by local electron cyclotron resonance in a well-shaped magnetic field

ASJC Scopus subject areas

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