Plasma-assisted molecular beam epitaxy of high optical quality MgZnO films on Zn-polar ZnO substrates

Yoshio Nishimoto, Ken Nakahara, Daiju Takamizu, Atsushi Sasaki, Kentaro Tamura, Shunsuke Akasaka, Hiroyuki Yuji, Tetsuo Fujii, Tetsuhiro Tanabe, Hidemi Takasu, Atsushi Tsukazaki, Akira Ohtomo, Takeyoshi Onuma, Shigefusa F. Chichibu, Masashi Kawasaki

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

The excellent structural and optical properties of pseudomorphic Mg xZn1-xO films (0 ≤ × ≤ 0:39) are reported in this work. The MgxZn1-xO films were grown on Zn-polar ZnO substrates by plasma-assisted molecular beam epitaxy. Those Mg xZn1-xO films for which x ≤ 0:18 exhibited atomically flat surfaces, and the typical full-width-at-half-maximum (FWHM) value of the (0002) X-ray diffraction ω-rocking curves for these films was 35 arcsec. The FWHM values were less than 100meV for the near-band-edge photoluminescence (PL) at 300 K. We observed PL lifetimes of the order of ns, and the longest fast-decay component reached 3.5 ns for the Mg0.12Zn0.88O alloy.

Original languageEnglish
Pages (from-to)912021-912023
Number of pages3
JournalApplied Physics Express
Volume1
Issue number9
DOIs
Publication statusPublished - 2008 Sep

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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