Piezoelectric properties of ZnO films on a sapphire substrate deposited by an RF-magnetron-mode ECR sputtering system

Michio Kadota, Makoto Minakata

Research output: Contribution to journalArticlepeer-review

31 Citations (Scopus)

Abstract

Compared to conventional RF magnetron sputtering systems, electron cyclotron resonance (ECR) sputtering systems are characterized by the ability to generate high-density plasma under low gas pressure. (1120)-plane oriented epitaxial ZnO films were deposited on an R-plane sapphire substrate using the RF-magnetron-mode ECR sputtering equipment. As the results of the measurement, the films showed a good orientation and excellent effective electromechanical coupling factors (Keff) for the Rayleigh surface acoustic wave (SAW) and its high-order SAW waves. These coupling factors were equal to or higher than the theoretical values keff obtained by the finite element method (FEM) analysis using a single crystal material constant.

Original languageEnglish
Pages (from-to)2923-2926
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume37
Issue number5 SUPPL. B
DOIs
Publication statusPublished - 1998 May

Keywords

  • ECR
  • SAW
  • Sapphire
  • Sezawa wave
  • Sputtering
  • ZnO

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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