Piezoelectric and optical properties of ZnO films deposited by an electron-cyclotron-resonance sputtering system

Michio Kadota, Toshinori Miura, Makoto Minakata

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

An electron-cyclotron-resonance (ECR) sputtering system enables the production of highly ionized plasma under low gas pressure, and it is considered that a ZnO film deposited by the ECR sputtering system is of higher quality than the one deposited by a conventional sputtering system. The ZnO films deposited on glass or sapphire substrates by ECR sputtering exhibited a high electrical resistivity (ρ > 1010Ω cm), excellent piezoelectric properties (generating strongly higher-frequency surface acoustic waves and having a larger electromechanical coupling factor), and good optical properties (showing free excitons on R-sapphire at 2 K and on c-sapphire at room temperature). C-V properties of the ZnO films dosed with N or As ions showed the properties of p-type.

Original languageEnglish
Pages (from-to)523-527
Number of pages5
JournalJournal of Crystal Growth
Volume237-239
Issue number1 4 I
DOIs
Publication statusPublished - 2002 Apr

Keywords

  • A1. Doping
  • B1. Oxides
  • B1. Zinc compounds
  • B2. Acousto-optic materials
  • B2. Piezoelectric materials
  • B3. Filters

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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