Physical properties of crystalline films prepared by sputtering in low impurity atmosphere

Haruhisa Ueda, Osamu Kitakami, Yutaka Shimada, Yoshiyuki Igari, Isao Kusunoki

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We report on high-quality crystalline Fe and Cu thin films prepared by sputtering in low impurity atmosphere (SLIA). According to X-ray photoelectron spectroscopy and secondary ion mass spectroscopy analyses, it was found that the SLIA films contain less impurities compared with those prepared by conventional DC and RF sputtering methods. Such a reduction of impurities markedly enhances the crystal growth and reduces the electrical resistivity.

Original languageEnglish
Pages (from-to)2015-2018
Number of pages4
JournalJapanese journal of applied physics
Volume33
Issue number4R
DOIs
Publication statusPublished - 1994 Apr

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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