TY - JOUR
T1 - Physical properties of crystalline films prepared by sputtering in low impurity atmosphere
AU - Ueda, Haruhisa
AU - Kitakami, Osamu
AU - Shimada, Yutaka
AU - Igari, Yoshiyuki
AU - Kusunoki, Isao
PY - 1994/4
Y1 - 1994/4
N2 - We report on high-quality crystalline Fe and Cu thin films prepared by sputtering in low impurity atmosphere (SLIA). According to X-ray photoelectron spectroscopy and secondary ion mass spectroscopy analyses, it was found that the SLIA films contain less impurities compared with those prepared by conventional DC and RF sputtering methods. Such a reduction of impurities markedly enhances the crystal growth and reduces the electrical resistivity.
AB - We report on high-quality crystalline Fe and Cu thin films prepared by sputtering in low impurity atmosphere (SLIA). According to X-ray photoelectron spectroscopy and secondary ion mass spectroscopy analyses, it was found that the SLIA films contain less impurities compared with those prepared by conventional DC and RF sputtering methods. Such a reduction of impurities markedly enhances the crystal growth and reduces the electrical resistivity.
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U2 - 10.1143/JJAP.33.2015
DO - 10.1143/JJAP.33.2015
M3 - Article
AN - SCOPUS:0028422436
VL - 33
SP - 2015
EP - 2018
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 4R
ER -