Abstract
We report on high-quality crystalline Fe and Cu thin films prepared by sputtering in low impurity atmosphere (SLIA). According to X-ray photoelectron spectroscopy and secondary ion mass spectroscopy analyses, it was found that the SLIA films contain less impurities compared with those prepared by conventional DC and RF sputtering methods. Such a reduction of impurities markedly enhances the crystal growth and reduces the electrical resistivity.
| Original language | English |
|---|---|
| Pages (from-to) | 2015-2018 |
| Number of pages | 4 |
| Journal | Japanese journal of applied physics |
| Volume | 33 |
| Issue number | 4R |
| DOIs | |
| Publication status | Published - 1994 Apr |
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)
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Ueda, H., Kitakami, O., Shimada, Y., Igari, Y., & Kusunoki, I. (1994). Physical properties of crystalline films prepared by sputtering in low impurity atmosphere. Japanese journal of applied physics, 33(4R), 2015-2018. https://doi.org/10.1143/JJAP.33.2015