Photosensitive polyetherimide (Ultem) based on reaction development patterning (RDP)

Takafumi Fukushima, Yukiko Kawakami, Toshiyuki Oyama, Masao Tomoi

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Fingerprint Dive into the research topics of 'Photosensitive polyetherimide (Ultem) based on reaction development patterning (RDP)'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science