Photosensitive polycarbonates based on reaction development patterning (RDP)

T. Oyama, Y. Kawakami, T. Fukushima, T. Iijima, M. Tomoi

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)

Abstract

Films of commercially available poly(bisphenol A carbonate) (BPA-PC) and poly[bisphenol A carbonate-co-4,4′-(3,3,S-trimethylcyclohexylidene)diphenol carbonate] (BPA-TMC-PC) containing photosensitive agent (diazonaphthoquinone (DNQ) compound) were prepared by spin-coating onto copper foil. The obtained films showed positive-tone behavior by UV irradiation and following development with ethanolamine/N-methylpyrrolidone (NMP)/H2O mixture (1/1/1 by weight). The scanning electron microscope (SEM) photographs of the resulting images exhibited fine patterns (∼ 10 μm line/space resolution) with 15-16 μm film thickness. The pattern forming mechanism is based on the Reaction Development Patterning (RDP), in which the carboxylic acid resulting from photo-rearrangement of DNQ in the film attracts ethanolamine in the developer and the amine reacts with carbonate in the main chain to induce degradation of the polymer. RDP, where the main pattern forming reaction occurs during the development, is proved to be efficient for polycarbonates as well as polyimide.

Original languageEnglish
Pages (from-to)175-181
Number of pages7
JournalPolymer Bulletin
Volume47
Issue number2
DOIs
Publication statusPublished - 2001 Nov 15
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Polymers and Plastics
  • Materials Chemistry

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