Photosensitive polyarylates based on reaction development patterning

Toshiyuki Oyama, Akira Kitamura, Takafumi Fukushima, Takao Iijima, Masao Tomoi

Research output: Contribution to journalArticlepeer-review

27 Citations (Scopus)

Abstract

Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin-coating onto copper foil, which showed positive-tone behavior after UV irradiation and development with an ethanolamine/N-methyl-pyrrolidone/H2O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9-14 μm film thickness. The pattern-forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern-forming reaction occurs during development.

Original languageEnglish
Pages (from-to)104-108
Number of pages5
JournalMacromolecular Rapid Communications
Volume23
Issue number2
DOIs
Publication statusPublished - 2002 Jan 31
Externally publishedYes

Keywords

  • Diazonaphthoquinone
  • Photoresists
  • Polyarylates
  • Polyesters
  • Reaction development patterning (RDP)

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

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