Photoresist removal-cleaning technology using cryogenic micro-solid nitrogen spray

Jun Ishimoto, U. Oh, Tomoki Koike, Naoya Ochiai

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

The fundamental characteristics of a thermomechanical resist removal-cleaning system using cryogenic micro-nano solid nitrogen spray flow was investigated using a new type of integrated measurement coupled numerical technique. The effect of ultra-high heat flux cooling on the resist removal performance due to the thermal contraction of resist material was clarified. It was numerically predicted that resist removal performance could be improved by the scraping effect of impinging micro-solid nitrogen particle with plastic deformation in the narrow region between the resist. Furthermore, it was numerically and xperimentally found that the hybrid interactive effects of fluid mechanical force by impingement of micro-solid particles and the thermomechanical effect due to ultra-high heat transfer characteristics contribute to the resist removal-cleaning process.

Original languageEnglish
Pages (from-to)N3046-N3053
JournalECS Journal of Solid State Science and Technology
Volume3
Issue number1
DOIs
Publication statusPublished - 2014

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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