Photoreactive chemisorbed monolayer suppressing polymer dewetting in thermal nanoimprint lithography

Hirokazu Oda, Tomoyuki Ohtake, Toshiaki Takaoka, Masaru Nakagawa

Research output: Contribution to journalArticlepeer-review

25 Citations (Scopus)

Abstract

We describe reactive-monolayer-assisted thermal nanoimprint lithography. The reactive monolayer inducing the graft reaction with thermoplastic poly(styrene) by ultraviolet light exposure was formed from 4-((10- mercaptodecyl)-oxy)benzophenone on a gold thin film. The photochemical graft reaction suppressed the thermally induced dewetting of a poly(styrene) thin film on the modified gold surface. As a result, the poly(styrene) thin film used as a resist layer for wet etching could be patterned by thermal nanoimprint lithography, and 100-nm-scale patterns of a gold thin film could be prepared simply by wet etching.

Original languageEnglish
Pages (from-to)6604-6606
Number of pages3
JournalLangmuir
Volume25
Issue number12
DOIs
Publication statusPublished - 2009 Jun 16

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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