Photopatterning of self-assembled monolayers to generate aniline moieties

Masaru Nakagawa, Kunihiro Ichimura

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

Comparative studies on the image-wise formation of surface aniline moieties in monolayers of silica substrates prepared by the photodegradation of surface-adsorbed 4-aminophenyltrimethoxysilane and the photodeprotection of chemisorbed o-nitrobenzyl N-phenylcarbamate monolayers were described. The difference in physicochemical affinity of imagewise UV-exposed surfaces was visualized clearly by the adsorption of fluorescent polystyrene microspheres on areas incorporating aniline moieties through diazotization.

Original languageEnglish
Pages (from-to)1-7
Number of pages7
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume204
Issue number1-3
DOIs
Publication statusPublished - 2002 May 23

Keywords

  • Diazotization
  • Fluorescent particle
  • Monolayer
  • Photopatterning
  • Self-assembly

ASJC Scopus subject areas

  • Surfaces and Interfaces
  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

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