The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ = 1.55μm are 0.4dB and > 40dB, respectively.
ASJC Scopus subject areas
- Electrical and Electronic Engineering