Photonic crystal polarisation splitters

Yasuo Ohtera; T. Sato; T. Kawashima; T. Tamamura; S. Kawakami

doi:10.1049/el:19990875

Photonic crystal polarisation splitters

Yasuo Ohtera, T. Sato, T. Kawashima, T. Tamamura, S. Kawakami

ENG - Communications Engineering

Research output: Contribution to journal › Article › peer-review

84 Citations (Scopus)

Abstract

The design, fabrication, and measurement of an a-Si/SiO₂ photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ = 1.55μm are 0.4dB and > 40dB, respectively.

Original language	English
Pages (from-to)	1271-1272
Number of pages	2
Journal	Electronics Letters
Volume	35
Issue number	15
DOIs	https://doi.org/10.1049/el:19990875
Publication status	Published - 1999 Jul 22

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1049/el:19990875

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title = "Photonic crystal polarisation splitters",

abstract = "The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ = 1.55μm are 0.4dB and > 40dB, respectively.",

author = "Yasuo Ohtera and T. Sato and T. Kawashima and T. Tamamura and S. Kawakami",

year = "1999",

month = jul,

day = "22",

doi = "10.1049/el:19990875",

language = "English",

volume = "35",

pages = "1271--1272",

journal = "Electronics Letters",

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publisher = "Institution of Engineering and Technology",

number = "15",

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TY - JOUR

T1 - Photonic crystal polarisation splitters

AU - Ohtera, Yasuo

AU - Sato, T.

AU - Kawashima, T.

AU - Tamamura, T.

AU - Kawakami, S.

PY - 1999/7/22

Y1 - 1999/7/22

N2 - The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ = 1.55μm are 0.4dB and > 40dB, respectively.

AB - The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ = 1.55μm are 0.4dB and > 40dB, respectively.

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U2 - 10.1049/el:19990875

DO - 10.1049/el:19990875

M3 - Article

AN - SCOPUS:0032666930

VL - 35

SP - 1271

EP - 1272

JO - Electronics Letters

JF - Electronics Letters

SN - 0013-5194

IS - 15

ER -

Photonic crystal polarisation splitters

Abstract

ASJC Scopus subject areas

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