Abstract
The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ = 1.55μm are 0.4dB and > 40dB, respectively.
Original language | English |
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Pages (from-to) | 1271-1272 |
Number of pages | 2 |
Journal | Electronics Letters |
Volume | 35 |
Issue number | 15 |
DOIs | |
Publication status | Published - 1999 Jul 22 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering