Photon-stimulated desorption study of a SiO, film surface

M. Niwano, Y. Takakuwa, H. Katakura, N. Miyamoto

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

Photon-stimulated desorption (PSD) experiments on thermal oxide films on Si have been performed using synchrotron radiation with photon energies in the Si 2p core-level excitation region, to investigate the chemical nature of the film surface. Mass analysis of the PSD ions is performed using a time-of-flight technique. H + is found to be the dominant ion species that desorbs from the film surface. It is observed that the H +PSD ion yield decreases exponentially with increasing the irradiation time of incident photons. The H +PSD ion yield as a function of photon energy exhibits a close similarity in spectral shape to the photoabsorption spectrum of SiO2. The present experimental results confirm us that hydrogen atoms exists on the outermost layer of SiO2 film, and provide direct evidence for Si-OH and Si-H termination of SiO2 films.

Original languageEnglish
Pages (from-to)212-216
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume9
Issue number2
DOIs
Publication statusPublished - 1991 Mar 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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