Photolithography on three-dimrnsional structures using spray coated negative and positive photoresists

V. K. Singh, M. Sasaki, K. Hane, Y. Watanabe, M. Kawakita, H. Hayashi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

Fabricating microelectromechanicalsystems (MEMS) structures poses many processing challenges. This paper describes photolithography on high aspect ratio microstructures. Transferred pattern depends on a deposited resist film quality. Spin coating cannot be used for preparing the quality resist film on the deep structures. We have developed spray coating technique using a negative photoresist. Lessons learned from spray conditions of the negative resist are applied to the positive resist, which requires higher technical level.

Original languageEnglish
Title of host publicationTRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers
Pages1445-1448
Number of pages4
DOIs
Publication statusPublished - 2005 Nov 9
Event13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05 - Seoul, Korea, Republic of
Duration: 2005 Jun 52005 Jun 9

Publication series

NameDigest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05
Volume2

Other

Other13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05
Country/TerritoryKorea, Republic of
CitySeoul
Period05/6/505/6/9

Keywords

  • Pinhole
  • Positive resist
  • Spray coating
  • Three-dimensional photolithography
  • Turbulent flow

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint

Dive into the research topics of 'Photolithography on three-dimrnsional structures using spray coated negative and positive photoresists'. Together they form a unique fingerprint.

Cite this