Photoemission study of the SiO2 /Si interface structure of thin oxide films on Si(100), (111), and (110) surfaces

Michio Niwano, Hitoshi Katakura, Yuki Takeda, Yuji Takakuwa, Nobuo Miyamoto, Atsushi Hiraiwa, Kunihiro Yaqi

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69 Citations (Scopus)

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