Photoemission study of synchrotron radiation induced reactions of TEOS adsorbed on silicon surface

Michio Niwano, Nubuo Miyamoto, John K. Simons, Sean P. Frigo, Richard A. Rosenberg

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

We have investigated the synchrotron radiation (SR) induced chemical reactions of tetraethoxysilane Si(OC2H5)4 (TEOS) adsorbed on Si, using photoemission spectroscopy. TEOS adsorbs on the Si surface with its molecular structure intact, at least below room temperature. SR in the vacuum ultraviolet region decomposes the TEOS molecules adsorbed on Si to form a silicon oxide like film, but some carbon remains in the film. Results of irradiation experiments on condensed layers of TEOS and water adsorbed on Si at 85 K indicate that the addition of water enhances the removal of carbon contamination in the oxide film.

Original languageEnglish
Pages (from-to)403-408
Number of pages6
JournalApplied Surface Science
Volume79-80
Issue numberC
DOIs
Publication statusPublished - 1994 May 2

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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