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Photoelectron intensity oscillation during chemical vapor deposition on Si(100) surface with Si2H6
Yuji Takakuwa, Yoshiharu Enta, Tetsuji Yamaguchi, Toyokazu Hori, Michio Niwano, Nobuo Miyamoto, Hiroyuki Ishida, Hitoshi Sakamoto, Toshihiko Nishimori, Hiroo Kato
Research output: Contribution to journal › Article › peer-review
9
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(Scopus)