Photoelectron diffraction study of the surfaces of Si(111)√3×√3-Al and - In with Mo Mζ and Cr Lα lines

S. Sumitani, T. Abukawa, R. Kosugi, S. Suzuki, S. Sato, S. Kono

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


Laboratory X-ray sources of Mo Mζ and Cr Lα lines were used for a photoelectron diffraction (PED) study of the well-documented surfaces of Si(111)√3×√3-Al and Si(111)√3×√3-In. Azimuthal angle PED patterns of Al 2p and In 3d core levels were measured and analyzed by a multiple scattering formalism. The determined geometric parameters showed good agreement with those already established. This indicates the good potential of a PED study with laboratory sources.

Original languageEnglish
Pages (from-to)245-250
Number of pages6
JournalJournal of Electron Spectroscopy and Related Phenomena
Publication statusPublished - 1999


  • Al
  • Cr L
  • In
  • Mo M
  • Photoelectron diffraction
  • Si(111) surface
  • XPD
  • √3×√3 surface

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry

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