Photoelectron diffraction and low energy electron diffraction studies of Cs, K/Si(001) surfaces

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Abstract

X-ray photoelectron diffraction patterns of Cs 3d core levels for the full-Cs-coverage Si(001)-2 × 1-Cs surface have been measured and analyzed kinematically. It is found from the analysis that one monolayer of Cs, i.e., Cs/surface-Si ratio of unity, is present over the substrate forming a double-layer (upper and lower) array of atoms. The arrangement of Cs atoms in the double layer is essentially the same as the K double layer for the Si(001)2 × 1-K surface. New surface orders are reported that can be formed by the deposition of Cs or K atoms onto an annealed Si(001) substrate.

Original languageEnglish
Pages (from-to)141-148
Number of pages8
JournalSurface Science
Volume214
Issue number1-2
DOIs
Publication statusPublished - 1989 Apr 4

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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