Photochemical reduction of graphene oxide (GO) by femtosecond laser irradiation

Muttaqin, Takahiro Nakamura, Shunichi Sato

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this study, we demonstrated a facile method for the reduction of graphene oxide (GO) by applying femtosecond laser pulse irradiation in aqueous colloidal solution. Utilization of femtosecond (fs) laser pulse irradiation enabled us to control GO reduction by adjusting laser fluence and irradiation time. The formation of reduced graphene oxide (rGO) was induced by solvated electrons generated through laser irradiation of colloidal GO solution, which was confirmed by means of UV-visible and Raman spectroscopy, XPS and XRD. By applying an optimum femtosecond laser condition, the interplanar spacing between carbon layers decreased significantly from 9.81 Å to 3.52Å indicating the effective removal of oxygen-containing groups from the basal plane of GO. Furthermore, the sheet resistivity of the fabricated rGO in disk form was 1,200 times lower than GO.

Original languageEnglish
Title of host publicationLaser-Based Micro-and Nanoprocessing X
EditorsCraig B. Arnold, Kunihiko Washio, Udo Klotzbach
PublisherSPIE
ISBN (Electronic)9781628419719
DOIs
Publication statusPublished - 2016
EventLaser-Based Micro-and Nanoprocessing X - San Francisco, United States
Duration: 2016 Feb 162016 Feb 18

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9736
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherLaser-Based Micro-and Nanoprocessing X
CountryUnited States
CitySan Francisco
Period16/2/1616/2/18

Keywords

  • Graphene oxide
  • aqueous solution
  • electrical resistivity.
  • femtosecond laser

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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