Photochemical behavior and photochemical acid generation of arylmethylsulfonylbenzenes

Yuko Kawashima, Motohiro Tagaya, Masaru Nakagawa, Tomokazu Iyoda

Research output: Contribution to conferencePaperpeer-review

Abstract

We previously developed a novel photosensitive monolayer bearing a 4-(benzylsulfonyl)phenyl moiety as a photoreactive unit leading to photopattern by photolithography. The photosensitive monolayer transforms a monolayer composed of benzenesulfinic acid moiety by ultraviolet light exposure. The transformation causes the monolayer surface to be hydrophilic. To use widely the photopatterned monolayer, the photosensitivity of the monolayer should be improved. In this study, we synthesized 13 types of arylmethylsulfonylbenzenes as model compounds and investigated their photochemical behaviors in 2-propanol by ultraviolet light exposure. The photogeneration of benzenesulfinic acid from the arylmethylsulfonylbenzenes was compared by UV-visible spectral measurement and titration.

Original languageEnglish
Number of pages1
Publication statusPublished - 2005 Dec 1
Externally publishedYes
Event54th SPSJ Annual Meeting 2005 - Yokohama, Japan
Duration: 2005 May 252005 May 27

Other

Other54th SPSJ Annual Meeting 2005
CountryJapan
CityYokohama
Period05/5/2505/5/27

Keywords

  • Photochemical acid generation
  • Photosensitive self-assembled monolayer

ASJC Scopus subject areas

  • Engineering(all)

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