Photocatalytic properties of TiO2 films prepared by O 2 cluster ion beam assisted deposition method

G. H. Takaoka, M. Kawashita, K. Omoto, T. Terada

Research output: Contribution to journalConference articlepeer-review

14 Citations (Scopus)


Titanium dioxide (TiO2) films were prepared on Si(1 0 0) substrate by oxygen (O2) cluster ion beam assisted deposition method. The TiO2 films prepared at a substrate temperature of 200 °C or less were amorphous, whereas those at a substrate temperature of 300 °C contained both rutile and anatase. The refractive indexes of the TiO2 films increased with increasing substrate temperature. The surface state of the TiO2 film was smooth at an atomic level. The TiO2 films prepared at a substrate temperature of 300 °C showed high photocatalytic decomposition of methylene blue by ultraviolet (UV) irradiation, similar to those of TiO2(1 0 0) bulk state in a rutile structure. The contact angle of the TiO2 film with an initial value of 75° decreased to 10° by UV irradiation for 30 min, although that for TiO2(1 0 0) bulk state in rutile structure remained at the initial value even after the UV irradiation. It is considered that anatase in the TiO2 films was contributed to both photocatalytic decomposition and photocatalytic hydrophilicity of the films.

Original languageEnglish
Pages (from-to)200-205
Number of pages6
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Issue number1-4
Publication statusPublished - 2005 May
Externally publishedYes
EventInelastic Ion-Surface Collisions Proceedings of the 15th International Workshop on Inelastic Ion-Surface Collisons -
Duration: 2004 Oct 172004 Oct 22


  • Anatase
  • Cluster ion beam
  • Photocatalytic property
  • Rutile
  • TiO

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation


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