Perpendicular coercivity enhancement of CoPt/TiN films by nitrogen incorporation during deposition

Hongyu An, Jian Wang, Janos Szivos, Takashi Harumoto, Takumi Sannomiya, Shinji Muraishi, Gyorgy Safran, Yoshio Nakamura, Ji Shi

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

The effect of N incorporation on the structure and magnetic properties of CoPt thin films deposited on glass substrates with TiN seed layers has been investigated. During the deposition of CoPt, introducing 20% N2 into Ar atmosphere promotes the (001) texture and enhances the perpendicular coercivity of CoPt film compared with the film deposited in pure Ar and post-annealed under the same conditions. From the in situ x-ray diffraction results, it is confirmed that N incorporation expands the lattice parameter of CoPt, which favors the epitaxial growth of CoPt on TiN. During the post-annealing process, N releases from CoPt film and promotes the L10 ordering transformation of CoPt.

Original languageEnglish
Article number203907
JournalJournal of Applied Physics
Volume118
Issue number20
DOIs
Publication statusPublished - 2015 Nov 28
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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