Periodic changes in surface microroughness with progress of thermal oxidation of silicon

Takeo Hattori, Masaaki Fujimura, Tomoyuki Yagi, Masatoshi Ohashi

    Research output: Contribution to journalArticlepeer-review

    19 Citations (Scopus)

    Abstract

    The periodic changes in surface microroughness of thermal oxide films formed on Si(100) surface with a period in thickness of 0.18 nm were discovered using a noncontact-mode atomic force microscope. This observation combined with structural studies of the interface implies that the layer-by-layer oxidation occurs locally.

    Original languageEnglish
    Pages (from-to)87-90
    Number of pages4
    JournalApplied Surface Science
    Volume123-124
    DOIs
    Publication statusPublished - 1998 Jan

    ASJC Scopus subject areas

    • Chemistry(all)
    • Condensed Matter Physics
    • Physics and Astronomy(all)
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

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