Periodic changes in surface microroughness with progress of thermal oxidation of silicon

Takeo Hattori; Masaaki Fujimura; Tomoyuki Yagi; Masatoshi Ohashi

doi:10.1016/S0169-4332(97)00432-7

Periodic changes in surface microroughness with progress of thermal oxidation of silicon

Takeo Hattori, Masaaki Fujimura, Tomoyuki Yagi, Masatoshi Ohashi

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

The periodic changes in surface microroughness of thermal oxide films formed on Si(100) surface with a period in thickness of 0.18 nm were discovered using a noncontact-mode atomic force microscope. This observation combined with structural studies of the interface implies that the layer-by-layer oxidation occurs locally.

Original language	English
Pages (from-to)	87-90
Number of pages	4
Journal	Applied Surface Science
Volume	123-124
DOIs	https://doi.org/10.1016/S0169-4332(97)00432-7
Publication status	Published - 1998 Jan

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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abstract = "The periodic changes in surface microroughness of thermal oxide films formed on Si(100) surface with a period in thickness of 0.18 nm were discovered using a noncontact-mode atomic force microscope. This observation combined with structural studies of the interface implies that the layer-by-layer oxidation occurs locally.",

author = "Takeo Hattori and Masaaki Fujimura and Tomoyuki Yagi and Masatoshi Ohashi",

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