Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing

Nguyen Van Toan; Masaya Toda; Takumi Hokama; Takahito Ono

doi:10.1109/MEMSYS.2017.7863639

Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing

Nguyen Van Toan, Masaya Toda, Takumi Hokama, Takahito Ono

ENG - Mechanical Systems Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

Pillars formed by metal assisted chemical etching (MACE) process as a post process on a silicon cantilever are presented in this work. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever have been successfully demonstrated. The high aspect silicon pillar structures from 20 to 40 with smooth surfaces and vertically etched shapes on the cantilever are formed by MACE. In addition, silicon cantilever with high aspect ratio pillars on its surface is proposed for humidity sensing application. The humidity sensing utilize the principle that the pillars stack together based upon the condensation behavior of water vapor on their surfaces.

Original language	English
Title of host publication	2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	1232-1235
Number of pages	4
ISBN (Electronic)	9781509050789
DOIs	https://doi.org/10.1109/MEMSYS.2017.7863639
Publication status	Published - 2017 Feb 23
Event	30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017 - Las Vegas, United States Duration: 2017 Jan 22 → 2017 Jan 26

Publication series

Name	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Volume	0
ISSN (Print)	1084-6999

Other

Other	30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017
Country/Territory	United States
City	Las Vegas
Period	17/1/22 → 17/1/26

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/MEMSYS.2017.7863639

Cite this

Van Toan, N., Toda, M., Hokama, T., & Ono, T. (2017). Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. In 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017 (pp. 1232-1235). [7863639] (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS); Vol. 0). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/MEMSYS.2017.7863639

Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. / Van Toan, Nguyen ; Toda, Masaya; Hokama, Takumi et al.

2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017. Institute of Electrical and Electronics Engineers Inc., 2017. p. 1232-1235 7863639 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS); Vol. 0).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Van Toan, N , Toda, M, Hokama, T & Ono, T 2017, Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. in 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017., 7863639, Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), vol. 0, Institute of Electrical and Electronics Engineers Inc., pp. 1232-1235, 30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017, Las Vegas, United States, 17/1/22. https://doi.org/10.1109/MEMSYS.2017.7863639

Van Toan N , Toda M, Hokama T, Ono T. Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. In 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017. Institute of Electrical and Electronics Engineers Inc. 2017. p. 1232-1235. 7863639. (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)). doi: 10.1109/MEMSYS.2017.7863639

Van Toan, Nguyen ; Toda, Masaya ; Hokama, Takumi et al. / Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017. Institute of Electrical and Electronics Engineers Inc., 2017. pp. 1232-1235 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)).

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title = "Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing",

abstract = "Pillars formed by metal assisted chemical etching (MACE) process as a post process on a silicon cantilever are presented in this work. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever have been successfully demonstrated. The high aspect silicon pillar structures from 20 to 40 with smooth surfaces and vertically etched shapes on the cantilever are formed by MACE. In addition, silicon cantilever with high aspect ratio pillars on its surface is proposed for humidity sensing application. The humidity sensing utilize the principle that the pillars stack together based upon the condensation behavior of water vapor on their surfaces.",

author = "{Van Toan}, Nguyen and Masaya Toda and Takumi Hokama and Takahito Ono",

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N2 - Pillars formed by metal assisted chemical etching (MACE) process as a post process on a silicon cantilever are presented in this work. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever have been successfully demonstrated. The high aspect silicon pillar structures from 20 to 40 with smooth surfaces and vertically etched shapes on the cantilever are formed by MACE. In addition, silicon cantilever with high aspect ratio pillars on its surface is proposed for humidity sensing application. The humidity sensing utilize the principle that the pillars stack together based upon the condensation behavior of water vapor on their surfaces.

AB - Pillars formed by metal assisted chemical etching (MACE) process as a post process on a silicon cantilever are presented in this work. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever have been successfully demonstrated. The high aspect silicon pillar structures from 20 to 40 with smooth surfaces and vertically etched shapes on the cantilever are formed by MACE. In addition, silicon cantilever with high aspect ratio pillars on its surface is proposed for humidity sensing application. The humidity sensing utilize the principle that the pillars stack together based upon the condensation behavior of water vapor on their surfaces.

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Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing

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