Partial sulfurization of laser-ablated titanium oxide film for the improvement in photocatalytic property

Takahiro Nakamura, Mitsugu Arata, Hideyuki Takahashi, Katsutoshi Yamamoto, Nobuaki Sato, Atsushi Muramatsu, Eiichiro Matsubara

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Photocatalytic titanium oxide (TiO2) thin films were prepared on quartz substrate by the pulsed laser deposition using Nd:YAG (λ = 1.064 μm) pulse laser. Subsequently, the films were sulfurized in H2S or CS2 atmosphere under various conditions. After the sulfurization of the film in H2S or CS2 at 1273 K for 1 h, the surface morphology and structure of the deposited TiO2 film were changed. The photocatalytic property of the film might be improved by the sulfurization using CS2 at the temperatures lower than 1273 K.

Original languageEnglish
Pages (from-to)685-687
Number of pages3
JournalMaterials Transactions
Volume44
Issue number4
DOIs
Publication statusPublished - 2003 Apr

Keywords

  • Grazing incidence X-ray scattering (GIXS)
  • Photocatalysis
  • Pulsed laser deposition (PLD)
  • Sulfurization
  • Titanium oxide

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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