Oxygen segregation and oxidation on a copper surface

K. Hono, H. W. Pickering, T. Hashizume, I. Kamiya, T. Sakurai

    Research output: Contribution to journalArticlepeer-review

    15 Citations (Scopus)


    The atom-probe field ion microscope was employed to study oxygen adsorption and oxidation on surfaces of two grades of copper: low-grade tough-pitch copper (99.9%) and high purity copper (99.999%). The source of the oxygen is the Cu2O inclusions which were present in the low-grade tough-pitch copper. The 99.9% grade copper was annealed in ultra-high vacuum (UHV). During heating the Cu2O inclusions dissolve and the oxygen content of the matrix increases. Surface enrichment of oxygen and oxide formation on the surface were found depending on the annealing conditions. No indication of oxidation and oxygen enrichment was found in the high purity copper (99.999%) under the same UHV conditions.

    Original languageEnglish
    Pages (from-to)90-102
    Number of pages13
    JournalSurface Science
    Issue number1
    Publication statusPublished - 1989 Apr 2

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry


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