Abstract
Development of field-effect transistors (FETs) using functional oxide films is currently an area of active research. To effectively modulate electrical conduction properties, the formation of oxide channel/gate insulator interface is critical. In this technical note, a gate insulator fabrication technique based on a poly(para-xylylene) coating method, some examples of FETs on new oxide materials, and potential applications to flexible oxide FETs are described.
Original language | English |
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Pages (from-to) | 207-210 |
Number of pages | 4 |
Journal | IEEJ Transactions on Electronics, Information and Systems |
Volume | 139 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2019 Jan 1 |
Keywords
- Electrostatic carrier accumulation
- Field effect
- Field-effect transistors
- Functional oxides
- Gate insulator
ASJC Scopus subject areas
- Electrical and Electronic Engineering