Oriented growth and electrical property of LiAl5O8 film by laser chemical vapor deposition

Chen Chi, Hirokazu Katsui, Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

LiAl5O8 films were prepared by laser chemical vapor deposition, and the effect of the deposition temperature (Tdep) on the orientation, microstructure, and deposition rate was investigated. In the Tdep range of 9801040 K, highly (110)-oriented LiAl5O8 film comprising flake-like grains elongated to [110] with flatter face of (111) formed at the maximum deposition rate of 70¯mh1. Above Tdep = 1050 K, dense LiAl5O8 films slightly oriented to (100) were deposited with faceted columnar grains of pyramidal and terrace shapes. The electrical properties of the LiAl5O8 films were examined using AC impedance spectroscopy. The complex plane plots of the dense LiAl5O8 film consisted of a semicircle associated with the bulk response and an inclined spike, suggesting the ionic conduction in the LiAl5O8 film.

Original languageEnglish
Pages (from-to)111-115
Number of pages5
JournalJournal of the Ceramic Society of Japan
Volume124
Issue number1
DOIs
Publication statusPublished - 2016 Jan

Keywords

  • CVD
  • High deposition rate
  • Impedance
  • Morphology
  • Texture

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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