Orientation- and concentration-dependent surfactant adsorption on silicon in aqueous alkaline solutions: Explaining the changes in the etch rate, roughness and undercutting for MEMS applications
M. A. Gosálvez, B. Tang, P. Pal, K. Sato, Y. Kimura, K. Ishibashi
Research output: Contribution to journal › Article › peer-review
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