Organosoluble silicon and germanium nanoclusters

Akira Watanabe, Tokuji Miyashita

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The organosilicon nanoclusters (OSI) and organogermanium nanocluster (OGE) which have a few nanometer sized silicon or germanium cluster and organic groups bonded to the nanocluster surfaces show solubility in common organic solvents and good film processability by solution coating method. Using the coating films as precursors, inorganic silicon and germanium films were prepared by heat treatment in vacuo and laser annealing. The structural changes of the Si and Ge skeletons of the OSI and OGE by heat treatment and laser annealing were investigated by Raman spectroscopy. The laser-annealed films showed Raman bands assigned to the polycrystalline structure. The micropatterning of polycrystalline Ge by laser direct writing method was demonstrated. The organosoluble OGE is expected to be applicable as a germanium ink which gives polycrystalline Ge film.

Original languageEnglish
Title of host publicationLow-Cost Solution-Based Deposition of Inorganic Films for Electronic/Photonic Devices
Pages110-115
Number of pages6
Publication statusPublished - 2008 Dec 1
Event2008 MRS Fall Meeting - Boston, MA, United States
Duration: 2008 Dec 22008 Dec 5

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1113
ISSN (Print)0272-9172

Other

Other2008 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period08/12/208/12/5

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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