Optimization of vertical profiles of SiGe HBT/BiCMOS by promoting emitter diffusion process

Makoto Miura, Hiromi Shimamoto, Reiko Hayami, Akihiro Kodama, Tatsuya Tominari, Takashi Hashimoto, Katsuyoshi Washio

Research output: Contribution to journalConference articlepeer-review

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Engineering & Materials Science