Optimization of nano-topography distribution by compensation of grinding conditions

N. Yoshihara, N. Nishikawa, M. Mizuno, T. Iyama, Tsunemoto Kuriyagawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Precision optical parts have become increasingly important in various fields, including semiconductors and imaging technologies. Currently, the form accuracy of an aspherical lens is less than 50 nm, and the maximum height roughness is less than 20 nm. However, nano-topography, which is periodic waviness of small amplitude, remains on the ground surface, resulting in grinding marks[1]. The presence of grinding marks on the ground surface disturbs the uniformity and deteriorates the accuracy of optical components. Therefore, we propose "Uniformity" as an additional criterion of quality for a ground surface. As grinding marks deteriorate the accuracy of optical instruments, the nano-topography needs to be controlled and uniformity needs to be improved. In this study, the distribution of the nano-topography on a ground surface is calculated theoretically. Using the calculated results, the actual grinding conditions can be estimated. The grinding conditions can then be compensated to optimize the distribution of the nano-topography.

Original languageEnglish
Title of host publicationProceedings of the 11th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2011
EditorsP. Shore, Henny Spaan, H. Van Brussel, Theresa Burke
Publishereuspen
Pages208-211
Number of pages4
ISBN (Electronic)9780955308291
Publication statusPublished - 2011 Jan 1
Event11th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2011 - Como, Italy
Duration: 2011 May 232011 May 26

Publication series

NameProceedings of the 11th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2011
Volume2

Other

Other11th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2011
CountryItaly
CityComo
Period11/5/2311/5/26

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Mechanical Engineering
  • Materials Science(all)
  • Instrumentation
  • Environmental Engineering

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  • Cite this

    Yoshihara, N., Nishikawa, N., Mizuno, M., Iyama, T., & Kuriyagawa, T. (2011). Optimization of nano-topography distribution by compensation of grinding conditions. In P. Shore, H. Spaan, H. Van Brussel, & T. Burke (Eds.), Proceedings of the 11th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2011 (pp. 208-211). (Proceedings of the 11th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2011; Vol. 2). euspen.