Precision optical parts have become increasingly important in various fields, including semiconductors and imaging technologies. Currently, the form accuracy of an aspherical lens is less than 50 nm, and the maximum height roughness is less than 20 nm. However, nano-topography, which is periodic waviness of small amplitude, remains on the ground surface, resulting in grinding marks. The presence of grinding marks on the ground surface disturbs the uniformity and deteriorates the accuracy of optical components. Therefore, we propose "Uniformity" as an additional criterion of quality for a ground surface. As grinding marks deteriorate the accuracy of optical instruments, the nano-topography needs to be controlled and uniformity needs to be improved. In this study, the distribution of the nano-topography on a ground surface is calculated theoretically. Using the calculated results, the actual grinding conditions can be estimated. The grinding conditions can then be compensated to optimize the distribution of the nano-topography.