Optimally stable electron cyclotron resonance plasma generation for precise ulsi patterning

Research output: Contribution to journalConference articlepeer-review

Abstract

This paper discusses microwave absorption around the electron cyclotron resonance (ECR) region in relation to the magnetic field profiles and microwave conditions, and shows how to achieve stable, uniform and efficient microwave absorption in an ECR plasma to prevent the instability. A high-performance multi-coil system and a new microwave introduction method developed for stable plasma generation are described. Experimental results show that sufficiently precise patterning suitable for practical use is achieved.

Original languageEnglish
Pages (from-to)202-212
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1803
DOIs
Publication statusPublished - 1993 Apr 16
Externally publishedYes
EventAdvanced Techniques for Integrated Circuit Processing II 1992 - San Jose, United States
Duration: 1992 Sep 201992 Sep 25

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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