TY - JOUR
T1 - Optimally stable electron cyclotron resonance plasma generation and essential points for compact plasma source
AU - Samukawa, Seiji
AU - Ishida, Toshinori
PY - 1992/12
Y1 - 1992/12
N2 - This study examines the strong dependence of electron cyclotron resonance (ECR) plasma generation on the microwave conditions and the magnetic field profiles in the ECR plasma. When an introduced microwave frequency oscillates and has a large ripple, the ECR plasma around the ECR region vibrates and regularly turns on and off. The microwave oscillation and the microwave ripple must be eliminated to prevent poor etching anisotropy. Moreover, the nonuniform plasma causes disturbed ion motions due to magnetohydrodynamic (MHD) plasma instability. It is found that uniform and high-density ECR plasma is generated by optimizing the waveguide, the location of the ECR region and the magnetic field profiles for precise ULSI patterning. Based on these results, we determine the essential features for realizing a compact ECR plasma source.
AB - This study examines the strong dependence of electron cyclotron resonance (ECR) plasma generation on the microwave conditions and the magnetic field profiles in the ECR plasma. When an introduced microwave frequency oscillates and has a large ripple, the ECR plasma around the ECR region vibrates and regularly turns on and off. The microwave oscillation and the microwave ripple must be eliminated to prevent poor etching anisotropy. Moreover, the nonuniform plasma causes disturbed ion motions due to magnetohydrodynamic (MHD) plasma instability. It is found that uniform and high-density ECR plasma is generated by optimizing the waveguide, the location of the ECR region and the magnetic field profiles for precise ULSI patterning. Based on these results, we determine the essential features for realizing a compact ECR plasma source.
KW - ECR plasma
KW - Magnetic fields
KW - Microwave conditions
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U2 - 10.1143/JJAP.31.4348
DO - 10.1143/JJAP.31.4348
M3 - Article
AN - SCOPUS:0026971879
VL - 31
SP - 4348
EP - 4356
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 12 S
ER -