Optical monitoring of a poly(styrene) residual layer on a photocrosslinkable monolayer in thermal nanoimprint lithography

Koichi Nagase, Tomoyuki Ohtake, Toshiaki Takaoka, Shoichi Kubo, Masaru Nakagawa

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

We investigated the residual layer thickness of a poly(styrene) thin film patterned by the reactive-monolayer-assisted thermal nanoimprint lithography using a SiO2 mold with convex patterns on mm-scale. The profile of the residual layer thickness was monitored optically with a reflective thickness monitor. We presented that the residual layer thickness was significantly influenced by maintained temperatures, molecular weights, and additives. Poly(styrene) containing its low molecular-weight component showed suitable concave patterns with the residual layer thickness uniform.

Original languageEnglish
Pages (from-to)201-204
Number of pages4
JournalJournal of Photopolymer Science and Technology
Volume22
Issue number2
DOIs
Publication statusPublished - 2009

Keywords

  • Polystyrene
  • Reactive monolayer
  • Residual layer thickness
  • Thermal nanoimprint

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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