Optical Diagnostics of a Pulsed Inductively Coupled Nitrogen Plasma

Toshiki Nakano, Seiichi Takaira, Takeshi Kitajima, Seiji Samukawa

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Temporal variation of electron energy distribution through a pulsed inductively coupled nitrogen plasma is discussed by the temporally resolved measurements of optical emission spectroscopy and laser-induced fluorescence. The intense intensity peak of the first negative band emission (N2 +) immediately after RF power application to the plasma is likely to be caused by the rapid increase and subsequent decrease in a ≈ 3-eV electron population because the electron impact excitation of ground state N2 + ions is assumed to cause the first negative band emission. The intensity peak for the second positive band emission (N2), the threshold energy of which is ≈11 eV, is also observed but even smaller than the first negative band emission, indicating the smaller enhancement of an electron population at ≈11 eV than that at ≈3 eV during electron heating after the RF power application.

Original languageEnglish
Pages (from-to)30-38
Number of pages9
JournalThe transactions of the Institute of Electrical Engineers of Japan.A
Volume125
Issue number1
DOIs
Publication statusPublished - 2005 Jan 1

Keywords

  • inductively coupled plasma
  • laser-induced fluorescence
  • nitrogen
  • optical emission spectroscopy
  • pulsed plasma

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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